This course will cover two main topics: atomic spectroscopy plasma source characterization techniques, comprising fundamental considerations of various temperatures and electron densities with emphasis on how these parameters are spectroscopically determined; and an in-depth focus on ICP-MS as an analytical tool. This aspect will cover sample introduction processes, especially with liquid samples using various nebulizers, spray chambers and droplet generators, and how their aerosol properties affect ICP-MS performance from a fundamental viewpoint, as well as consider different ICP-MS detection platforms (single and triple quadrupole, time of flight and magnetic sector instruments) as well as common interferences and their removal.